Smee lithography

In the realm of lithography technology, smee lithography, China has been making significant strides towards self-sufficiency in chip production. With the development of ultraviolet UV based lithographic technology at Shanghai Micro Electronic Equipment SMEEChina aimed to produce its own smee lithography chips by the end of and 20nm chips by earlywithout relying on US fabrication technology and equipment.

Shanghai Micro Electronics Equipment Group SMEE , a Chinese developer of lithography tools, announced its first machine capable of processing wafers using a 28nm-class process technology, reports Bloomberg. This advancement represents a major leap in China's quest to close the technological gap in the global chip industry. The announcement did not come without oddities. But after that, the company changed its post and removed any mentions of the 28nm-capable tool, focusing on the fact that SMEE was committed to building advanced lithography machines. This is a bit surprising as SMEE said in October that it would introduce a 28nm-capable lithography tool by the end of the year. It's the latest development in a tit-for-tat chip war pitting the United States against China: The latest export rules set by the U.

Smee lithography

Shanghai Micro Electronics Equipment SMEE , China's most successful lithography scanner manufacturer, reiterated plans this week to deliver its first scanner capable of producing chips on a 28nm-class fabrication process by the end of the year, reports TechWire Asia, citing newspaper Securities Daily , which in turn cites an unnamed source. A 28nm-capable lithography tool will over time enable Chinese chipmakers to rely on domestic lithography equipment for a range of mature technologies. The move is part of China's broader goal to achieve semiconductor self-sufficiency and reduce its dependence on foreign technology. But the question remains as to whether SMEE can produce this scanner in mass quantities, and when it can make such scanners available to substitute for machines from ASML, Canon, and Nikon. The latest export regulations from the U. As a result, China needs advanced domestic lithography tools to ensure that its chipmakers can produce chips on even fairly advanced process technologies, such as 14nm. After it does this, it will still take some time for the chipmaker to integrate the new scanner into its production flow. However, it will only do this only if SMEE can produce a sufficient number of such tools. Join the experts who read Tom's Hardware for the inside track on enthusiast PC tech news — and have for over 25 years. Over the past couple of decades, he has covered everything from CPUs and GPUs to supercomputers and from modern process technologies and latest fab tools to high-tech industry trends. US Edition. Stay on the Cutting Edge Join the experts who read Tom's Hardware for the inside track on enthusiast PC tech news — and have for over 25 years.

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At more advanced nodes below 28 nanometers, leading Chinese firms continue to have access to some advanced Western tools, particularly deep ultraviolet DUV immersion lithography systems, that they will continue to use for as long as possible to stretch logic production at more advanced nodes, particularly down to 7 and even 5 nanometers. Nevertheless, it is important to note that using DUV tools for advanced node production is complex, because using techniques like multi-patterning also requires advanced capabilities in other key tools such as deposition and etch. Materials such as photoresists are also critical to the process of extending DUV capabilities to fine feature lengths at 7 nanometers and below. Even though U. Continued access to Western tools such as DUV—coupled with some foreign and increasingly domestic etch and deposition tools—can provide a bridge to an all-domestic future for Chinese semiconductor manufacturing.

Smee lithography

Shanghai Micro Electronics Equipment SMEE , China's most successful lithography scanner manufacturer, reiterated plans this week to deliver its first scanner capable of producing chips on a 28nm-class fabrication process by the end of the year, reports TechWire Asia, citing newspaper Securities Daily , which in turn cites an unnamed source. A 28nm-capable lithography tool will over time enable Chinese chipmakers to rely on domestic lithography equipment for a range of mature technologies. The move is part of China's broader goal to achieve semiconductor self-sufficiency and reduce its dependence on foreign technology. But the question remains as to whether SMEE can produce this scanner in mass quantities, and when it can make such scanners available to substitute for machines from ASML, Canon, and Nikon. The latest export regulations from the U. As a result, China needs advanced domestic lithography tools to ensure that its chipmakers can produce chips on even fairly advanced process technologies, such as 14nm. After it does this, it will still take some time for the chipmaker to integrate the new scanner into its production flow. However, it will only do this only if SMEE can produce a sufficient number of such tools. Join the experts who read Tom's Hardware for the inside track on enthusiast PC tech news — and have for over 25 years. Over the past couple of decades, he has covered everything from CPUs and GPUs to supercomputers and from modern process technologies and latest fab tools to high-tech industry trends.

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Social Links Navigation. Some reports claim they are able to use these machines to produce chips as small as 7nm. Over the past couple of decades, he has covered everything from CPUs and GPUs to supercomputers and from modern process technologies and latest fab tools to high-tech industry trends. Mar 13, Anton Shilov. Nikon and Canon to compete in lithography market share with cost-effective tools. GPT-4 can play Doom, badly — doesn't hesitate to shoot humans and demons. With the development of ultraviolet UV based lithographic technology at Shanghai Micro Electronic Equipment SMEE , China aimed to produce its own 28nm chips by the end of and 20nm chips by early , without relying on US fabrication technology and equipment. Amdlova said:. These restrictions, targeting chipmaking gear, which is a weak link in China's semiconductor supply chain, can be seen as a strategic alignment with the US-led "Chip-4 Alliance," aiming to curb China's semiconductor industry. Some subscribers prefer to save their log-in information so they do not have to enter their User ID and Password each time they visit the site. Feb 19, Contact me with news and offers from other Future brands Receive email from us on behalf of our trusted partners or sponsors.

The economic cold war rages on. In October, the US imposed restrictions on AI chips and semiconductor manufacturing equipment , but it did not fully address all concerns.

It remains unclear whether SMEE can deliver these machines in bulk, as they still rely to some extent on foreign equipment. Email address. This advancement represents a major leap in China's quest to close the technological gap in the global chip industry. Still a lot of semi work done larger than 10nm out there. Please login to read more New users, please register first. Feb 20, Home Tech Semiconductors. Nov 6, The latest export regulations from the U. Mar 13, Access to premium content. The most advanced lithography machines, such as EUV machines, have hundreds of thousands of components, making reliance on the global supply chain essential.